Microelectronics Water Treatment

ULTRAPURE WATER-Micro 2013 is a two-day conference on Microelectronics Pure Water. The conference consists of state-of-the-art technical papers and Table-Top exhibits. Click here for a printable version of the Registration form. Click here for a Tabletop Reservation form. Click here to register online.

Final Technical Program
Moderators:
Slava Libman, Ph.D., Balazs NanoAnalysis; Marty Burkhart, Hi Pure Tech, Inc.; and Rich Riley, Intel

Tuesday, November 12
8:15 AM-Conference Introduction
Session 1: Key Business and UPW Technology Trends
8:30 AM- Materials Challenges for Advanced Nodes

Kyle Flanigan, Linx Consulting
9:15 AM- Particle Control Challenges in UPW
Abbas Rastegar, Ph.D., SEMATECH
10:00-10:15 AM-Networking Break
10:15 AM- SEMI-ITRS Update – 5 (F57)

Slava Libman, Ph.D., Balazs NanoAnalysis; David Blackford, Ph.D., Fluid Measurement Technologies
10:45 AM-Treatment Processes for the Next Decade of UPW.
Philippe Rychen, D. Gensbittel, Rene Sauer, Malek Salamor, Ovivo
11:15 AM- Inhibition of Copper Corrosion by Removal of H2O2 from UPW Using Noble Metal Catalysis
Daisaku Yano, Masami Murayma, Takashi Futatsuki, and Koji Yamanaka. Organo
11:45 AM-1:15 PM—Lunch Break

Session 2: Innovations with UPW Design and Water Management
1:15 PM- Advanced Removal Technology of Hydrogen Peroxide Using Nanosize Pt Catalyst Resin
Yoichi Miyazaki, Take Fukui, and Hideki Kobayashi, Kurita Water Industries; and Kentaro Yamada, Nippon Sheet Glass Co. Ltd.
1:45 PM- Water and Wastewater Infrastructure Development for a Semiconductor Manufacturing Campus
Ralph Williams and Annabelle Fonseca, CH2M Hill; and Mark Masse, Genesee County Economic Development Center (Batavia, N.Y.)
2:15 PM- Designing a UPW System to Optimize for UPW Unit Costs versus Lowest Capital Costs Will Result in a Long-Term Competitive Advantage for the Life of the Plant
Matthew Weglewski, M&W Group; and John Morgan, H2Morgan
2:45 PM— Direct Measurement of 185-nm Ultraviolet Light for TOC Reduction
Jay Arling, Oliver Lawal, and Dan Shaver, Aquionics Inc.; Bryan Townsend, Black & Veatch
3:15 PM-Networking Break
3:45 PM- Direct Osmosis-High Salinity Membrane Cleaning and Restoration: 2013 Update

Hal Stansfield, Ameren Energy Resources; and Dick Youmans and David Paul, David H. Paul, Inc.
4:15 PM-Dynamic UPW Distribution Modeling to Optimize Supply POU Pressure
Matthew Weglewski, M&W Group; and John Morgan, H2Morgan
4:45 PM- Roundtable: Role of Cross Industry Collaboration in Support to the Next Generation Semiconductor Industry Needs
5:45 PM-Reception in Tabletop Exhibits


Wednesday, November 13
Session 3: Advances in UPW Metrology
8:15 AM- TOC Screening with LC-OCD: Current Status
Stefan Huber, Ph.D., DOC-Labor; Slava Libman, Ph.D., Balazs NanoAnalysis
8:45 AM- The Effect of Particle Concentration and Face Velocity on the Removal of Sub-100-nm Particles from Ultrapure Water
Don Grant and Gary Van Schooneveld, CT Associates, Inc.; and Uwe Beuscher, WL Gore and Associates
9:15 AM-Challenges and Results of sub-40-nm Particle Detection in UPW
Michael Thomas, Lighthouse Worldwide Solutions
9:45 AM- Validating the Counting Efficiency of Liquid Optical Particle Counters below 100 nm
Gary Van Schooneveld, Chris Howe, Don Grant, CT Associates; David Blackford, Ph.D., Fluid Measurement Technologies; and Michael Thomas, Lighthouse Worldwide Solutions
10:15 AM- Networking Break
10:45 AM- Acoustic Method for Detecting Nano Particles in UPW

Sameer Madanshetty, Uncopiers Inc.
11:30 AM- Extending the Value of Resistivity for Optimizing Microelectronics Water System Performance
David M. Gray, Mettler-Toledo Thornton Inc.; and Philippe Rychen, Ovivo Switzerland AG
Noon-1:15 PM-Lunch Break

Session 4: Advanced Materials in UPW Application
1:15 PM- 30 years of PVDF Fluid Handling Systems for High Purity Water Processes

Rosemary Heinze, Arkema Inc
1:45 PM-Why Are Fluoropolymers the Best Choice for UPW Distribution Systems
Giovanni Biressi, Ph.D., and Brigitte Neubauer, Ph.D., Solvay Specialty Polymers
2:15 PM- A Study of the Effect of Elastomeric Seals Exposed to Ozone
Katrin Wallheinke, Wolfgang Paul and Jeffrey Sixsmith, Georg Fischer Piping Systems; Casey Williamson, Semtec, Inc. and Marty Burkhart, Hi Pure Tech, Inc.
2:45 PM- UPW Reclaim, Reuse, and Recycle
Dan Wilcox, Spansion
3:15 PM- Conference Concludes

TABLETOP EXHIBITS
Exhibit hours: Tuesday: 1:00PM-7:00PM; Wednesday: 11:00AM-3:00PM.

2012 Exhibitors: * ARKEMA INC. * ASAHI AMERICA INC. * AVISTA TECHNOLOGIES INC.  * CHEMTRACE * FLUID MEASUREMENT TECHNOLOGIES * HEATEFLEX CORP. * HYDRANAUTICS * ITOCHU SPECIALTY CHEMICALS * LEVITRONIX GMBH * LIGHTHOUSE WORLDWIDE SOLUTIONS * METTLER TOLEDO THORNTON  * NEOTECH AQUA SOLUTIONS * OVIVO * PARTICLE MEASURING SYSTEMS  * PLAST-O-MATIC VALVES * SIEMENS WATER TECHNOLOGIES * SWAN ANALYTICAL USA INC.

Contact Information Quick Links Information Customer Service

Tall Oaks Publishing Inc.
60 Golden Eagle Lane
Littleton, Colorado U.S.A.
Telephone: (+1) 303.973.6700
Home Page

ULTRAPURE WATER journal is a registered trademark of Tall Oaks Publishing Inc. in the U.S.A., European Union, and China.
INDUSTRIAL WATER TREATMENT is a trademark of Tall Oaks Publishing Inc.