Ultra Pure Water

Date	Title	Authors
2006‑11	Short-bed IX and its potential application in semiconductor water treatment	Michael Sheedy & Michael Dejak
2006‑11	An in-depth study of copper selective resins and activated carbon processes in treating CMP wastewaters	Michael W. Wismer & Richard E. Woodling
2006‑10	Use of reynolds number as a criteria for design of high-purity water systems	Slava Libman
2006‑10	Performance testing of a new electropositive filter	Fred Tepper & Leonid Kaledin
2006‑08	Which particle counter is best for you	Ed Terrell
2006‑08	The use of EDI technology to recycle HF acid wastes from scrubbers and thermal treatment units	Chris P. Jones et al.
2006‑08	An overview on IX performance, monitoring, and troubleshooting	Wayne E. Burnahl
2006‑06	Improvements of semiconductor water treatment using spiral-wound EDI	Thomas Menzel & Swen Beusshausen
2006‑06	Improved treatment of diluted fluoride waste through the use of RO	Michael Lurie et al.
2006‑04	The use of membrane distillation in high-purity water production for the semiconductor industry	Chuanfeng Liu & Andrew Martin
2006‑02	Rouging: The phenomenon and its control in high-purity water systems	Russell D. Kane
2006‑02	Part 1: Advancements in the design and simulation of UV reactors aid chloramines reduction in high-purity water	Ben Adelstein et al.
2005‑12	Removal of dissolved oxygen from high-purity water_Much ADO about nothing	John H. Rydzewski
2005‑12	Disinfection plays important role in water treatment	Mike Henley

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