Archive


Table Tiles

Date Title Authors Lead Text
2002‑02 Identification of critical contaminants by applying an understanding of different TOC measuring technologies John Rydzewski
2002‑02 Photolytic destruction of TOC in spent rinse waters by H2O2 and UV radiation Robert P. Donovan
2002‑01 Ozone injection system for bacterial control and sterilization in high-purity water Tracy Boswell et al.
2002‑01 Effects of space velocity on the performance of the final polishing mixed bed in typical high-purity water plants Avijit Dey et al.
2002‑01 Microbiology aspects of industrial and high-purity water treatment Larry Owen
2002‑01 Water conservation and materials issues in microelectronics production Thomas M. Laronge & Mark A. Lisin
2001‑12 Interaction of metallic contamination from liquids and solid surface in semiconductor processing Steven Verhaverbeke
2001‑12 Role of high-purity water in future cleaning of silicon wafer by wet cleaning process Drew Sinha
2001‑10 Cost reduction and operating results of an RO-EDI treatment system Eric Matzan et al.
2001‑10 Start-up and commissioning of a semiconductor high-purity water treatment plant Paul Tan & Roger Wiebusch
2001‑10 A case study in the use of EDI for the production of electronics-grade water J. H. Wood et al.
2001‑10 Fundamentals of protective coatings and linings in water treatment Samuel E. Speer
2001‑09 Copper CMP wastewater chemistry and treatment Gerald A. Krulik et al.
2001‑09 Part 2: Impact of caustic dosing on contaminant removal using double-pass RO Avijit Dey et al.

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