| 2001‑09 |
Progress report on new on-line boron analysis research |
Karla Dennis et al. |
|
| 2001‑09 |
Testing new chemistries for RO element treatment |
Peter S. Zisson & Dick Youmans |
|
| 2001‑08 |
Improvements to final polish mixed-bed resin for semiconductor high-purity water |
Lance Chiaverini et al. |
|
| 2001‑08 |
Part 1: Effect of interstage caustic dosing on the silica, boron, and organic removal using double-pass RO |
Avijit Dey et al. |
|
| 2001‑08 |
Oxygen removal from water by two innovative membrane techniques |
Rick van der Vaart et al. |
|
| 2001‑08 |
Water reuse and reclaim operations at Hyundai Semiconductor America |
Mehdi Golshan & Shannon Schmitt |
|
| 2001‑08 |
Producing high-purity water with shallow-shell resins |
Don Downey |
|
| 2001‑06 |
Performance of a treatment loop for recycling spent rinse waters |
Robert P. Donovan et al. |
|
| 2001‑06 |
Verification of analytical instrument performance using an automated standard dilution apparatus |
Richard Godec & Karen Franklin |
|
| 2001‑06 |
Pros and cons of EDI technology in microelectronics application |
Benoit Pare & Roy Hango |
|
| 2001‑06 |
Fundamentals of high-purity water used in microelectronic applications |
Larry Owen & Micheal Tragesser |
|
| 2001‑06 |
Treatment of CMP wastewater in microelectronics applications |
Malek Salamor |
|
| 2001‑04 |
The use of high-efficiency RO in semiconductor applications |
Lisa M. Farmen & Chuck Dale |
|
| 2001‑04 |
Recent progress in RO elements for high-purity water production |
Yasushi Maeda |
|
