Ultra Pure Water

Date	Title	Authors
2000‑10	High-purity product qualification using electron spectroscopy for chemical analysis (ESCA) methodology	Frank N. Patrick
2000‑09	Microelectronics industry_Chemically assisted microfiltration in wastewater treatment	E. H. Zelle Zeiher et al.
2000‑09	Cleaning and scale prevention in reverse osmosis systems	Daniel Comstock
2000‑09	Useful photocatalysts: Application in high-purity water treatment	Samuel E. Speer
2000‑09	Process considerations and source reduction opportunities for high-purity water in wet cleaning of silicon wafer	Drew Sinha
2000‑08	Water reduction in the regeneration of microelectronics ion exchangers	William A. Bornak
2000‑08	Electrodeionization replaces aging mixed beds serving semiconductor manufacturing	Benoit Pare & Roy A. Hango
2000‑08	Boron removal from high-purity water by selective ion-exchange	Dan Wilcox et al.
2000‑08	Trends in the use of ion chromatography for monitoring high-purity water at semiconductor plants	Beverly Newton & Kenneth H. Summerville
2000‑08	Solid phase microextraction and GC-MS analysis of trihalomethanes in high-purity water	Kefei Wang & Samantha Tan
2000‑08	Monitoring deionization capacity of an ion exchange system	David M. Gray
2000‑08	Areas to consider when selecting an EDI system	Eli Salem
2000‑06	Criteria, tools, and practices for high-purity water distribution systems	Chris Dreyer et al.
2000‑06	Conceptual design for CMP wastewater recycle	Jack Martyak & Steven R. Gagnon

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