Archive


Table Tiles

Date Title Authors Lead Text
1999‑12 An analysis and understanding of analytical techniques used to determine extraction potential with PVDF resins Gary M. Dennis & David A. Seiler
1999‑12 An overview of sanitation concerns in the semiconductor industry Peter S. Cardwrighte
1999‑11 Some guidelines for the design of ion-exchange processes aiming at producing high-purity water Pascale Borg et al.
1999‑10 A comparison of different EDI concepts used for the production of high-purity water Sven Thate et al.
1999‑10 Membrane processes for water treatment in the semiconductor industry Rolf Nagel & Thomas Will
1999‑10 Radioactivity monitoring and control in high-purity water Marco G. Giammarchi
1999‑10 Prediction of IX resin bed differential pressure at high flowrate using ergun equation modifications Erin Stueve & Monty McCoy
1999‑10 Some principles of ion-exchange plant design Francois de Dardel
1999‑10 Portable continuous TOC monitoring in a semiconductor water system Doug Bender & Anthony B. Bevilacqua
1999‑09 Lessons learned: The installation of a 300 to 600 GPM semiconductor high-purity water system John Weems & Ken Pandya
1999‑08 EDI and membranes: Practical ways to reduce chemical usage when producing high-purity water William E. Katz
1999‑08 pH measurement for the microelectronics industry: Choosing the proper electrode Shane Filer et al.
1999‑06 Improved water management in microelectronics manufacturing Thomas Fulde
1999‑06 The use of high-purity water in the wafer-cleaning process Drew Sinha

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