| 1996‑12 |
Construction and coordinated building techniques for high purity water systems |
John C. Bryant |
|
| 1996‑12 |
Advanced fluoropolymers for semiconductor process systems: Surface properties of E-CTFE |
Gary Stanitis & Gary H. Husted |
|
| 1996‑12 |
A new water treatment system for the latest generation of semiconductor devices |
Rene R. Sauer & Sandro Della Vedova |
|
| 1996‑12 |
Water Conservation in the microelectronics industry |
Richard Striekwold |
|
| 1996‑10 |
Organics, TOC, Color, Turbidity, and SDI pretreatment for unit operations |
Susan L. Coulter |
|
| 1996‑10 |
High-purity water by electrochemical treatment |
Herbert Neumeister et al. |
|
| 1996‑09 |
A comparative study of bacterial attachment to high-purity water system surfaces |
Richard J. Gillis & John R. Gillis |
|
| 1996‑08 |
Packed-bed versus holdown ion exchange |
Annegrethe Hansen & Ravi Subramanian |
|
| 1996‑06 |
Correlation of boron breakthrough versus resistivity and dissolved silica in RO & DI system |
Sushma Malhotra et al. |
|
| 1996‑06 |
Application of continous laser particle-counting system to high-purity water |
Roy Hango |
|
| 1996‑04 |
Critical aspects of membrane transport, separation, and processing |
Rajindar Singh |
|
| 1996‑04 |
Instrumentation considerations with a high-purity water system |
Jeff Hargroves |
|
| 1996‑02 |
Unique temperature compensation for conductivity and resistivity measurements |
David M. Gray & Anthony C. Bevilacqua |
|
| 1996‑02 |
Silica chemistry and reverse osmosis |
Lee F. Comb |
|
