Archive
| Date | Title | Authors | Lead Text |
|---|---|---|---|
| 2010‑01 | A Review of Challenges and Opportunities Facing the Water Business | Steve Maxwell | The water industry is a disparate business. Although we casually talk about the ﾓwater industry,ﾔ... |
| 2009‑12 | Part 2: Effect of System Impurities on Gypsum Control | Zahid Amjad, Ph.D. | The deposition of mineral deposits of calcium containing salts on heat exchangers and reverse osm... |
| 2009‑12 | Part 1: Emerging Water Chemistry Issues in Combustion Turbine Evaporative Coolers | Daniel J. Robinette, P.E., and Charlie Nichols, P.E. | Evaporative coolers are used extensively in the power industry to increase power output from comb... |
| 2009‑12 | An Overview of Power Generation Water Treatment | David Paul | This edition of Ultrapure Water is devoted to power generation water treatment. This Back to Bas... |
| 2009‑12 | MF and RO: A Useful Combination for Plant Make-up Water Treatment | Brad Buecker | As the later discussion on RO illustrates, removal of suspended solids from RO feed is absolutely... |
| 2009‑11 | Part 1: Major Components that Make Up the Water Business | Mike Henley | Water. Where is the market going, and what opportunities lie in this most important industry tha... |
| 2009‑11 | Important Considerations for Implementing Laboratory Water Standards | Jamie Grossi | The non-regulated laboratory environment has long been an overlooked aspect of the water purifica... |
| 2009‑11 | Damage to RO Membranes by the Overuse of Ion-Exchange Resin Cleaning Chemicals in Pretreatment Softeners | Timothy J. Miller | In October 2005, Purdue University opened the Birck Nanotechnology Center (BNC). Providing offic... |
| 2009‑11 | Transient Boron Leakage in a Semiconductor Water System | Lindsey Stahl & Jeff Chapman | The presence of boron in ultrapure water (UPW*) for semiconductors has until recently been monito... |
| 2009‑11 | Measurement of Sub-50-nm Particle Retention by UPW Filters | Don Grant & Uwe Beuscher | The critical features size of state-of-the-art semiconductor devices is on the order of 50 nanome... |
| 2009‑11 | Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes | Annie Xia et al. | To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat... |
| 2009‑10 | Use of an Iron-Specific Resin For the Removal of Iron from Groundwater | Renu Saraf | Iron is a common metallic element found in nature. Water percolating through soil and rocks disso... |
| 2009‑10 | Part 5: Other Reports on Promising Nanotechnology Treatments for Water Treatment | Mike Henley | An alternative. As we push toward 2010, nanotechnology is revolutionizing traditional technologi... |
| 2009‑10 | Effect of Polymers for Gypsum Scale Control in Industrial Water Systems | Zahid Amjad, Ph.D. | Scaling of heat exchangers, reverse osmosis (RO) membrane, and equipment surfaces by carbonates, ... |
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