Ion-exchange Organics Particles

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Abstract

Investigating methods for improving the removal of inorganic and organic contaminants, perceived and real, from water, thus producing ultrapure water (UPWa) to minimize yield failure concerns, is an ongoing process. As line widths for semiconductor devices become tighter, it has become critical to address not only particulate and ionic contaminants, but also specific organic issues. A service companyb has developed processes that specifically address the total organic carbon (TOC) levels coming from elements such as chloroform, urea, isopropyl alcohol (IPA), and others to reduce them to sub part-per-billion (ppb) levels. This has been shown to have significant benefits in integrated chip (IC) manufacturing, and improved life cycle costs of critical process equipment components. This article will explain the process and the benefits where TOC excursions and critical UPW process parameters are maintained for the manufacturing process.

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