Ultrapure
Dynamic Distribution Modeling To Optimize Point-of-use Supply Pressure
By John Morgan and Matthew Weglewski
DESIGN FABS GREENFIELD HOT DI WATER PIPING POU SEMICONDUCTORS DISTRIBUTION SYSTEMS
Abstract
Ultrapure water systems are typically the most complex process systems associated with the manufacturing of semiconductor devices. These systems are often extremely large, contain many specialized unit operations, and have very rigid quality and operating specifications (specs) at the usage points. One of these operating specs, UPW supply pressure, is normally the most critical parameter for operating fabs at these usage points, or point-of-use locations. The importance of POU supply pressure led to the creation of SEMI standard F63-0211 (1), which acts as a guide for pressure stability requirements for the design of a UPW system. This article also examines distribution systems, high DI water, piping, fabs, and greenfield locations.
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