Archive


Table Tiles

February 2002

Identification of critical contaminants by applying an understanding of different TOC measuring technologies

By John Rydzewski

Photolytic destruction of TOC in spent rinse waters by H2O2 and UV radiation

By Robert P. Donovan

January 2002

Ozone injection system for bacterial control and sterilization in high-purity water

By Tracy Boswell et al.

Microbiology aspects of industrial and high-purity water treatment

By Larry Owen

Effects of space velocity on the performance of the final polishing mixed bed in typical high-purity water plants

By Avijit Dey et al.

Water conservation and materials issues in microelectronics production

By Thomas M. Laronge & Mark A. Lisin

December 2001

Interaction of metallic contamination from liquids and solid surface in semiconductor processing

By Steven Verhaverbeke

Role of high-purity water in future cleaning of silicon wafer by wet cleaning process

By Drew Sinha

October 2001

Cost reduction and operating results of an RO-EDI treatment system

By Eric Matzan et al.

A case study in the use of EDI for the production of electronics-grade water

By J. H. Wood et al.

Start-up and commissioning of a semiconductor high-purity water treatment plant

By Paul Tan & Roger Wiebusch

Fundamentals of protective coatings and linings in water treatment

By Samuel E. Speer

September 2001

Copper CMP wastewater chemistry and treatment

By Gerald A. Krulik et al.

Part 2: Impact of caustic dosing on contaminant removal using double-pass RO

By Avijit Dey et al.

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