Archive


Table Tiles

September 2001

Progress report on new on-line boron analysis research

By Karla Dennis et al.

Testing new chemistries for RO element treatment

By Peter S. Zisson & Dick Youmans

August 2001

Improvements to final polish mixed-bed resin for semiconductor high-purity water

By Lance Chiaverini et al.

Oxygen removal from water by two innovative membrane techniques

By Rick van der Vaart et al.

Producing high-purity water with shallow-shell resins

By Don Downey

Part 1: Effect of interstage caustic dosing on the silica, boron, and organic removal using double-pass RO

By Avijit Dey et al.

Water reuse and reclaim operations at Hyundai Semiconductor America

By Mehdi Golshan & Shannon Schmitt

June 2001

Performance of a treatment loop for recycling spent rinse waters

By Robert P. Donovan et al.

Pros and cons of EDI technology in microelectronics application

By Benoit Pare & Roy Hango

Treatment of CMP wastewater in microelectronics applications

By Malek Salamor

Verification of analytical instrument performance using an automated standard dilution apparatus

By Richard Godec & Karen Franklin

Fundamentals of high-purity water used in microelectronic applications

By Larry Owen & Micheal Tragesser

April 2001

The use of high-efficiency RO in semiconductor applications

By Lisa M. Farmen & Chuck Dale

Recent progress in RO elements for high-purity water production

By Yasushi Maeda

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