New advantages in the production of ultra-low TOC effluents with virgin resins

By Michael C. Gottlieb & Peter S. Meyers

An examination of pipe self cleaning in high-purity water systems

By Jörg Klauer

Evaluating the limitations of current technologies and improvements in future analytical methods

By Gregory Carr

Resistivity instruments to meet semiconductor processing requirements

By Victor M. Braga

Removal of arsenic and fluoride from GaAs wastewaters

By Gerald Krulik et al.

Analysis of bacterial contamination in different sections of a high-purity water system

By Morven B. McAlister et al.

UV light for chlorine removal in a high-purity water system

By Pamela Reeves et al.

A classical approach to the sizing of polishing UV TOC reducers in high-purity water plants

By Avijit Dey et al.

The effect of plastic tubing type on oxygen and resistivity measurements in high-purity water

Are polyvinylidene fluoride zero static valves really zero static?

By Tom Rogala et al.

Total organic carbon content influenced by trace amines in high-purity water

By Chung-Hsien Liang & Eyck Chen

TOC reduction using membrane technology

By Dean Schwarz

Water conservation in semiconductor plants

By Hsi-An Kwong

The use of fuzzy logic to improve operation of primary ion exchange

By William E. Bornak